New Entegris 10 nanometer liquid filter helps semiconductor makers ramp next technology node
Press release [Tuesday 4 September 2012]
Entegris, Inc. will feature the 10 nanometer-rated Intercept HPM liquid filter, its latest generation of advanced filtration solutions for very demanding advanced semiconductor manufacturing, at the SEMICON Taiwan tradeshow being held in Taipei, Taiwan, on September 5 - 7, 2012.
This new version of the Intercept HPM family of filters is designed to remove particles and other contaminants from dilute liquid chemistries and solutions used in the wet etch and clean process at leading edge semiconductor fabs. The new filter uses surface modified, asymmetric UPE (ultra-high molecular weight polyethylene) membrane which is hydrophilic to provide the highest level of cleanliness and particle retention while maintaining high process flows.
"As the semiconductor industry continues to develop more advanced chip designs using sub-20 nanometer process technologies, more advanced filtration is needed to achieve the desired defectivity levels," said Todd Edlund, vice president and general manager of the Entegris Contamination Solutions Division. "The 10 nanometer-rated Intercept HPM filter expands our broad offering of liquid filters, and complements our Torrento line of advanced high-flow filters used for aggressive chemistries."
For more information about the Intercept HPM or other Entegris filtration, purification, and wafer and reticle handling solutions, come visit our booth #174 at TWTC Nangang Exhibition Hall.
Entegris Intercept cartridge and disposable filters