After TSMC chairman C.C. Wei said on a recent earnings call that AI demand is real and that AI is becoming embedded in daily life as a long-term trend, expectations for ASML's performance...
ASML Holding's management says demand tied to artificial intelligence is proving more durable than previously expected, with customers accelerating capacity planning that is likely...
ASML Holding NV (ASML) reported record financial results for 2025, supported by a significant rebound in fourth-quarter bookings as semiconductor manufacturers increased investments...
Industry sources stated that Samsung has signed equipment contracts and placed orders for extreme ultraviolet (EUV) photomask pellicle-related equipment for its Taylor fab with South...
Samsung Electronics will reportedly begin test operations of extreme ultraviolet lithography equipment at its Taylor, Texas, fabrication plant in March, ahead of full operations planned...
With China and Japan launching successive anti-dumping probes and export controls on rare earths and key semiconductor materials, the risk of China's advanced-process supply chain...
ASML, the Dutch semiconductor equipment leader and exclusive supplier of EUV lithography systems, is set to release its fourth-quarter 2025 and full-year financial results on January...
Samsung Electronics is set to introduce South Korea-made mask blanks into its extreme ultraviolet (EUV) process starting as early as the second quarter of 2026. According to ET...
TSMC is undertaking significant upgrades at its existing 8-inch and 12-inch fabrication facilities that process chips at 90nm and above, while accelerating expansion for cutting-edge...
Following reports that the US government had granted annual export licenses to South Korea's Samsung Electronics and SK Hynix, the US Department of Commerce (DOC) has also approved...
A disclosure on China's government procurement platform shows that Shanghai Micro Electronics Equipment (SMEE) has won a contract to supply a step-and-scan lithography system valued...
Intel has completed acceptance testing of the industry's first commercial high-NA EUV lithography system with a numerical aperture of 0.55, the ASML Twinscan EXE:5200B, laying the...
