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TSMC to install multiple-beam lithography system in 2009

Claire Sung, Taipei; Steve Shen, DIGITIMES Asia Wednesday 5 November 2008 0

Taiwan Semiconductor Manufacturing Company (TSMC) is expected to install its first multiple-electron-beam direct write (MEBDW) lithography system for the development of 20nm and more advanced process nodes at the earliest in 2009, according to Burn...

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