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KLA-Tencor extends reticle inspection systems to 2Xnm

Press release; Jessie Shen, DIGITIMES Tuesday 15 September 2009 0

KLA-Tencor has introduced the Teron 600-series reticle defect inspection system to address a major transition in mask design at the 2Xnm logic (3Xnm half-pitch memory) node. The new system will introduce programmable scanner-illumination capability...

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