Applied intros photomask etch solution for quadruple patterning at 10nm and beyond

Press release; Jessie Shen, DIGITIMES Asia Tuesday 21 April 2015 0

Applied Materials has announced the Applied Centura Tetra Z Photomask Etch system for etching next-generation optical lithographic photomasks needed by the industry to continue multiple patterning scaling to the 10nm node and beyond.

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