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Kioxia announces completion of new flash memory fab at Kitakami site

Jessie Shen, DIGITIMES Asia, Taipei 0

Kitakami Plant (K2 is on the left, K1 is on the right). Credit: Kioxia

Kioxia has announced that the construction of Fab2 (K2) at its factory site in Kitakami was completed in July. K2 is the second flash memory manufacturing facility at Kioxia's Kitakami site in Iwate Prefecture, Japan.

As demand recovers, the company plans to progressively increase capital investments while constantly monitoring flash memory market developments. Kioxia intends to begin operations at K2 in the fall of calendar year 2025.

In addition, commencing in November 2024, some administrative and engineering departments will relocate to a new administration building adjacent to K2 to monitor its operations, Kioxia indicated.

Kioxia's new K2 fab project will have a portion of its investment subsidized by the Japanese government under a plan agreed in February 2024.

Kioxia's aim of "uplifting the world with memory'" includes exploiting flash memory market prospects for rising demand for AI applications and data centers. Kioxia will continue to proactively undertake steps to enhance its flash memory R&D capabilities, as well as make agile investments in response to market trends, according to the Japan-based memory vendor.

Kioxia held a 12.4% share of the global NAND flash market in the second quarter of 2024, according to DRAMeXchange.