A subsidiary of China-based Hunan Kaimeite Gases has recently announced that its lithography gas product has been certified as a qualified supplier of Cymer, a subsidiary of Dutch...
Cymer, an ASML company engaged in the development of lithography light sources used by chipmakers to pattern advanced semiconductor chips, has announced the availability of its second-generation...
Cymer, an ASML company developing lithography light sources used by chipmakers to pattern advanced semiconductor chips, has announced the shipment of its first XLR 700ix light source...
Cymer, an ASML company, has announced its new argon fluoride (ArF) immersion light source, the XLR 700ix. Built on the XLR platform, the 700ix provides improvements in bandwidth,...
ASML's new EUV system, the NXE:3300B, has obtained 18 orders. In order to meet customer demand, the lithography tool vendor is looking to boost its production capacity for EUV tool...
ASML and Cymer have entered into a definitive agreement under which ASML will acquire all outstanding shares of Cymer in a cash-and-stock transaction currently valued at EUR1.95 billion...
Cymer expects its business to double by 2015 from 2010 thanks to development of the company's emerging products. Specializing in excimer laser illumination sources for deep ultraviolet...
Cymer's XLR 600ix light source has been integrated into a scanner at Nikon, and successfully installed at the Asia-based chipmaker. The 60-90 watt (60-90W) immersion light source...
Cymer, which specializes in excimer laser illumination sources for deep ultraviolet (DUV) photolithography systems, has kicked off shipments of what it claims is the world's first...
