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News tagged EUV
  • Last update: Wednesday 11 September 2013 [20 news items]

ASML lands rising EUV equipment orders; looking to expand capacity

Sep 11, 14:07

ASML's new EUV system, the NXE:3300B, has obtained 18 orders. In order to meet customer demand, the lithography tool vendor is looking to boost its production capacity for EUV tool...

ASML to acquire litho light source supplier Cymer

Oct 18, 10:25

ASML and Cymer have entered into a definitive agreement under which ASML will acquire all outstanding shares of Cymer in a cash-and-stock transaction currently valued at EUR1.95 billion...

TSMC says still considering ASML proposal

Jul 20, 01:10

Taiwan Semiconductor Manufacturing Company (TSMC) is still evaluating the proposal from ASML for joint development of new technologies, and no decision has been made yet, according...

TSMC expects to report another record sales for the third quarter of 2012, but sees dips ahead

ASML updates EUV progress

Mar 2, 01:05

ASML has been developing the next generation of its NXE-series EUV lithography machines, the 3300 series, according to Peter Jenkins, VP of marketing at the Dutch fab tool supplier...

Peter Jenkins of ASML

New ASML-IMEC deal demos move to EUV lithography

Oct 11, 10:33

IMEC has announced that it has signed a new agreement with ASML for a period of five years (2011-2015). The pair's continued collaboration guarantees the global semiconductor ecosystem...

ASML NXE:3100 for EUV litho at an IMEC cleanroom

450mm and EUV linked with uncertainty, says SEMI

Sep 9, 11:14

The transition to manufacturing semiconductors on larger wafers continues to be one of the hottest topics in the industry. However, uncertainty with EUV rollout has exacerbated the...

ASML to ship 10 EUV tools in 2012

May 16, 11:40

ASML has received 10 orders for its next-generation ultraviolet (EUV) lithography system – the NXE:3300 – with deliveries starting in 2012, according to the Dutch fab...

Commentary: Financially-strapped Taiwan DRAM makers have difficulties migrating to sub-20nm processes

Dec 27, 09:39

Taiwan-based DRAM makers will find themselves at a disadvantage to migrate their production to 20nm and below processes, as they struggle to preserve cash for the expenses needed...

Rexchip reportedly orders EUV lithography tool from ASML

Dec 7, 02:25

ASML has recently invited DRAM companies to make early reservations for extreme ultraviolet (EUV) lithography tools to avoid a repeat of early 2010, when immersion scanners saw constrained...

EUV to get ready for high-volume production in 2014, says IMEC chief

Oct 21, 14:04

Extreme ultraviolet (EUV) lithography is likely to reach mass production in 2014 at the earliest, according to Luc Van den hove, president and CEO of Belgian researcher IMEC. But...

IMEC CEO and president Luc Van den hove

TSMC to take delivery of EUV lithography system in 2011, says R&D head

Jun 25, 10:28

Taiwan Semiconductor Manufacturing Company (TSMC) will take delivery of its first extreme ultraviolet (EUV) lithography system from ASML in 2011 paving the way for the company to...

Shang-yi Chiang, head of R&D at TSMC

TSMC to take delivery of ASML EUV lithography system

Feb 22, 10:45

ASML Holding today announced that Taiwan Semiconductor Manufacturing Company (TSMC) will take delivery of a Twinscan NXE:3100 extreme ultra-violet (EUV) lithography system. This tool...

ASML upbeat on micro-lithography growth

Oct 12, 15:47

Customers have turned more active in placing orders, according to Antonio Mesquida Kusters, Director of Market Intelligence for ASML. Citing predictions by research firms, Kusters...

Antonio Mesquida Küsters, Director of Market Intelligence for ASML

UMC focusing R&D on 28nm, 22nm processes

Sep 30, 14:23

United Microelectronics Corporation (UMC) currently focuses its R&D on 28nm and 22nm processes and related key technologies as well as 18-inch wafers, according to company central...

KLA-Tencor extends reticle inspection systems to 2Xnm

Sep 15, 14:04

KLA-Tencor has introduced the Teron 600-series reticle defect inspection system to address a major transition in mask design at the 2Xnm logic (3Xnm half-pitch memory) node. The new...

KLA-Tencor keeping up R&D spending despite difficult times

Sep 2, 16:49

R&D expenses are estimated to equal 25% of KLA-Tencor's overall sales in 2009, with the expenditure mainly on the development of next-generation products for 3X/2Xnm and beyond...

KLA Tencor CMO Brian Trafas

Cymer ships laser-produced plasma EUV lithography source to ASML

Jul 14, 15:15

Cymer, which specializes in excimer laser illumination sources for deep ultraviolet (DUV) photolithography systems, has kicked off shipments of what it claims is the world's first...

Semiconductor lithography sector continues to outperform rest of market, says The Information Network

Mar 23, 11:40

High-priced equipment enabled the semiconductor lithography sector to grow to 25% of entire front-end equipment processing market in 2008, according to market research firm The Information...

ASML to start shipping EUV systems for sub 22nm node by 2010

Dec 25, 16:39

Shipments of semiconductor equipment supplier ASM Lithography's (ASML's) extreme ultraviolet (EUV) systems for 22nm and sub-22nm process nodes are expected to kick off by 2010, according...

KW Cheng, the strategic sales and marketing vice president of Asia Pacific

Sematech advances EUV resist development

Aug 13, 11:18

Sematech engineers, working closely with researchers from major resist suppliers, have demonstrated chemically amplified EUV resist (CAR) platforms that support 22nm half-pitch resolution...

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  • IMEC+EUV+sensor+dies

    IMEC EUV sensor dies

    IMEC has successfully qualified a chipset consisting of custom high-quality EUV sensor dies. These are now being integrated in ASML's NXE:3100 EUV lithography tools in the field,...

    Photo: Company, Oct 13.

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