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Micron on the advantages of stacking

Gary Cheng, Jack Lu and Stephen Taylor, DigiTimes.com, Taipei Tuesday 14 September 2004 0

With respect to a given lithography node – whether it’s 0.11- or 0.13-micron – both stack and trench processes are implementing 8F² technology. However, the various suppliers do not use standardized nomenclature to describe their...

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