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NEWS TAGGED HIGH-NA
Friday 11 September 2026
Samsung, SK Hynix eye 2028 High-NA DRAM rollout

SK Hynix is targeting 2028 to apply High-NA extreme ultraviolet lithography to DRAM mass production and is considering joining an industry...

Thursday 10 September 2026
Analysis: China chases EUV as chipmakers move to High-NA
The extreme ultraviolet (EUV) lithography race is splitting into two tracks. Intel has moved High-NA EUV into production, Samsung Electronics and SK Hynix are targeting DRAM production...
Wednesday 9 September 2026
Huawei orchestrates China's DUV lithography push to cut reliance on ASML
Huawei is emerging as a central organiser of China's effort to build a domestic semiconductor equipment supply chain, backing critical lithography suppliers and helping connect them...
Friday 21 August 2026
Samsung holds off on High-NA EUV until 1nm production
Samsung Electronics does not expect to move High-NA EUV lithography into volume production until its 1nm-class generation, a timeline that points to around 2030, after it had earlier...
Thursday 13 August 2026
Samsung delays High-NA EUV adoption until 1nm production in 2030
Samsung Electronics plans to introduce high-numerical-aperture extreme ultraviolet (High-NA EUV) lithography into mass production at its 1nm node around 2030, according to South Korean...
Thursday 13 August 2026
SK Hynix expands EUV roadmap with High-NA tools and PSM adoption
SK hynix said it is advancing its use of extreme ultraviolet (EUV) lithography for the mass production of next-generation DRAM, with high-numerical-aperture (High-NA) EUV equipment...
Thursday 23 July 2026
Intel 18A adopts High-NA EUV in dual-certification push
Intel Foundry has moved high numerical aperture (High-NA) EUV lithography into production on its Intel 18A process, with ASML confirming in a recent press release that Intel is using...
Tuesday 21 July 2026
Samsung keeps High-NA EUV rollout cautious as foundry profitability remains the focus

Samsung Electronics is taking a slower approach than Intel to High-NA extreme ultraviolet (EUV) lithography for advanced chip production,...

Sunday 19 July 2026
ASML supplier Trumpf says South Korea EUV demand is growing faster than Taiwan's
High-NA EUV lithography is becoming the semiconductor equipment industry's next major battleground as demand rises for more advanced chips used in artificial intelligence, high-performance...
Wednesday 20 May 2026
ASML to deliver first High-NA chips within months despite cost concerns
ASML expects its first advanced semiconductors made using next-generation High-Numerical Aperture (High-NA) extreme ultraviolet (EUV) lithography equipment to ship within months.
Sunday 26 April 2026
ASML cuts management layers due to restructuring; TSMC stance affects High-NA outlook

ASML is moving to eliminate a wide range of management roles as part of a broader effort to simplify its organization and improve execution,...

Thursday 17 July 2025
ASML ships first High-NA EUV tool; Intel takes lead as TSMC, Samsung hold back
ASML posted stronger-than-expected second-quarter 2025 earnings and projected a 15% jump in revenue for 2025 while maintaining a robust gross margin forecast of around 52%. However,...
Friday 27 June 2025
ASML bets on High-NA EUV as Intel, TSMC, Samsung delay mass adoption over cost and risk
ASML, the world's sole provider of extreme ultraviolet (EUV) lithography machines, is pressing ahead with its next-generation High-NA (numerical aperture) EUV systems—even as...
Tuesday 17 June 2025
ASML's next act: High-NA, Hyper-NA and the edge of what's possible
ASML Holding NV, the Dutch semiconductor equipment leader, dominates extreme ultraviolet (EUV) lithography, key to producing cutting-edge semiconductor chips. As the industry pushes...
Tuesday 18 March 2025
Samsung races to close 2nm gap: first High-NA EUV deployed at Hwaseong
Samsung Electronics reportedly deployed its first high-NA Extreme Ultraviolet (EUV) lithography machine at its Hwaseong Campus in early March. The move represents a key step in Samsung's...