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TSMC to take delivery of EUV lithography system in 2011, says R&D head

Ingrid Lee, Hsinchu; Jessie Shen, DIGITIMES Asia Friday 25 June 2010 0

Taiwan Semiconductor Manufacturing Company (TSMC) will take delivery of its first extreme ultraviolet (EUV) lithography system from ASML in 2011 paving the way for the company to migrate to a 20nm process in 2013, according to company senior R&D...

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