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NEWS TAGGED EUV
Thursday 25 December 2008
ASML to start shipping EUV systems for sub 22nm node by 2010
Shipments of semiconductor equipment supplier ASM Lithography's (ASML's) extreme ultraviolet (EUV) systems for 22nm and sub-22nm process nodes are expected to kick off by 2010, according...
Wednesday 13 August 2008
Sematech advances EUV resist development
Sematech engineers, working closely with researchers from major resist suppliers, have demonstrated chemically amplified EUV resist (CAR) platforms that support 22nm half-pitch resolution...