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Chinese firm develops ArF photoresists for 90-28nm chip production

Amanda Liang, Taipei; Willis Ke, DIGITIMES Asia Friday 19 May 2023 0

Credit: DIGITIMES

China's Nanta Opto-electronic Material has successfully developed DUV ArF photoresists that can support production of 90-28nm chips, aiming to serve import-substitution demand for photoresists used in mature manufacturing processes, according to industry...

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