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Nikon aims to reclaim market share with ASML-compatible ArF immersion lithography system

Chiang, Jen-Chieh, Taipei; Sherri Wang, DIGITIMES Asia 0

Credit: AFP

Nikon plans to introduce a new ArF immersion lithography system platform in fiscal year 2028 (April 2028 - March 2029) that offers compatibility with ASML equipment, marking a strategic move to challenge the market leader's dominance in semiconductor...

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