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Samsung races to close 2nm gap: first High-NA EUV deployed at Hwaseong

Amy Fan, Taipei; Levi Li, DIGITIMES Asia Tuesday 18 March 2025 0

Credit: AFP

Samsung Electronics reportedly deployed its first high-NA Extreme Ultraviolet (EUV) lithography machine at its Hwaseong Campus in early March. The move represents a key step in Samsung's push for sub-2nm semiconductor manufacturing. Despite lagging...

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