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KLA intros electron-beam defect inspection system

Jessie Shen, DIGITIMES, Taipei Wednesday 22 July 2020 0

KLA has announced the eSL10 e-beam patterned-wafer defect inspection system, which is designed to accelerate time-to-market for high-performance logic and memory chips, including those that rely on extreme ultraviolet (EUV) lithography, by detecting...

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